• 文献标题:   RF Performance Projections of Graphene FETs vs. Silicon MOSFETs
  • 文献类型:   Article
  • 作  者:   RODRIGUEZ S, VAZIRI S, OSTLING M, RUSU A, ALARCON E, LEMME MC
  • 作者关键词:  
  • 出版物名称:   ECS SOLID STATE LETTERS
  • ISSN:   2162-8742
  • 通讯作者地址:   KTH Royal Inst Technol
  • 被引频次:   14
  • DOI:   10.1149/2.001205ssl
  • 出版年:   2012

▎ 摘  要

A graphene field-effect-transistor (GFET) model calibrated with extracted device parameters and a commercial 65 nm silicon MOSFET model are compared with respect to their radio frequency behavior. GFETs slightly lag behind CMOS in terms of speed despite their higher mobility. This is counterintuitive, but can be explained by the effect of a strongly nonlinear voltage-dependent gate capacitance. GFETs achieve their maximum performance only for narrow ranges of V-DS and I-DS, which must be carefully considered for circuit design. For our parameter set, GFETs require at least mu = 3000 cm(2) V-1 s(-1) to achieve the same performance as 65 nm silicon MOSFETs. (C) 2012 The Electrochemical Society.