▎ 摘　　要

Selective graphene growth has been simultaneously achieved on oxidized silicon substrate with three kinds of pre-patterned rectangular metal films, i.e., Cu/Ni double layer, and Ni and Cu single layer film, by atmospheric chemical vapor deposition at 1020A degrees C. The top graphene maintains the micron-scale patterning of the metal film underneath. It was found that single layer graphene growth is more favorable on the Cu/Ni double layer film than on either single layer. The morphology and structure study of the pre-patterned metal substrates before and after graphene growth indicated that Ni functions as a buffer layer to significantly weaken the lattice mismatch between the copper and silicon substrate, resulting in a smoother and larger grain-sized Cu surface. It is also suggested that Ni diffuses to the Cu surface and participates in the graphene growth during the chemical vapor deposition (CVD) process. Defect-free single layer graphene growth can be obtained when the ratio of Cu/Ni is appropriate with respect to their thickness and the feature size of rectangular patterning.