▎ 摘　　要

In this paper, we want to outline the principles of how scanning probe lithography on graphene is performed. We will show several examples of structures etched in graphene using this technique, including an example of a nanoelectronic device. In the last part, we present data regarding the oxidation kinetics when performing scanning probe lithography on graphite (HOPG). [GRAPHICS] Two lines oxidized in graphene using scanning probe lithography. The left line (indicated by the arrow) is only 30 nm wide, indicating that this technique has good enough resolution to create nanoelectronic device structures. (C) 2010 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim