• 文献标题:   Very low-temperature growth of few-layer graphene by Ni-induced crystallization of amorphous carbon in vacuum
  • 文献类型:   Article
  • 作  者:   CHEN YY, WANG JY, SCHUTZENDUBE P, WANG ZM, MITTEMEIJER EJ
  • 作者关键词:  
  • 出版物名称:   CARBON
  • ISSN:   0008-6223 EI 1873-3891
  • 通讯作者地址:   Tianjin Univ
  • 被引频次:   5
  • DOI:   10.1016/j.carbon.2019.12.017
  • 出版年:   2020

▎ 摘  要

Graphene of thickness a few atomic layers has been grown in Ni/a-C bilayers at temperatures as low as 300 degrees C by Ni-induced crystallization of the amorphous carbon (a-C) in high vacuum. The mechanism of such very low-temperature growth of graphene has been investigated by a combinatorial experimental approach including x-ray diffraction, scanning electron microscopy, Auger electron spectroscopy, x-ray photoelectron spectroscopy and transmission electron microscopy. The growth of this few atomic layer thickness graphene has been found to be mediated by a coupled grain-boundary (GB) diffusion/surface diffusion mechanism. GBs in the top Ni sublayer provide fast diffusion paths for C atoms through the Ni layer, as a result of which graphene layers form above the Ni. The revealed low-temperature growth mechanism of graphene induced by contact with a metal can be applicable in advancing research fields as metal-matrix graphene composites and advanced energy storage devices. (C) 2019 Elsevier Ltd. All rights reserved.