• 文献标题:   Observation of the integer quantum Hall effect in high quality, uniform wafer-scale epitaxial graphene films
  • 文献类型:   Article
  • 作  者:   PAN W, HOWELL SW, ROSS AJ, OHTA T, FRIEDMANN TA
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Sandia Natl Labs
  • 被引频次:   15
  • DOI:   10.1063/1.3525588
  • 出版年:   2010

▎ 摘  要

We report the observation of the integer quantum Hall states at Landau level fillings of nu=2, 6, and 10 in a Hall bar device made of a single-layer epitaxial graphene film on the silicon-face of silicon-carbide prepared via argon-assisted graphitization. The two-dimensional electron gas exhibits a low-temperature (at 4 K) carrier mobility of similar to 14 000 cm(2)/V s at the electron density of 6.1 x 10(11) cm(-2). Furthermore, the sheet resistance obtained from four-probe measurements across the whole area (12 x 6 mm(2)) of another specimen grown under similar condition displays roughly uniform values (similar to 1600 Omega/square), suggesting that the macroscopic steps and accompanying multilayer graphene domains play a minor role in the low-temperature electronic transport. (C) 2010 American Institute of Physics. [doi:10.1063/1.3525588]