▎ 摘　　要

Photoresists play an increasingly important role in industrial fields like micro-electro mechanical systems, micromachining, and chip packaging. However, the traditional one-component photoresist is insulated, and additional steps are required to make it conductive, which complicates the process and limits its application. In order to solve the problem, we establish a one-step strategy to build conductive composite photoresist. Herein, graphene (GR) and silver nanowire (AgNW) are doped into SU-8 photoresist to fabricate a photo-patternable conductive composite. The composite photoresist is employed to make micro-patterns on an ITO electrode using photolithography, followed by electrochemical reduction of copper nanoparticles (CuNPs) to produce a nonenzymatic sensing coating. Experimental results prove that the response current of the obtained sensor is linearly related to the concentration of hydrogen peroxide in the range of 1-25 mM. The sensitivity and detection limit of the sensor are 41.8 mu A mM(-1) cm(-2) and 9 mu M, respectively. Moreover, excellent sensing performance including anti-interference, repeatability, and stability demonstrates the potential application of CuNPs/AgNW/GR/SU-8 composite material in electrochemical sensing.