• 文献标题:   Graphene-FET-based gas sensor properties depending on substrate surface conditions
  • 文献类型:   Article, Proceedings Paper
  • 作  者:   NAKAMURA M, KANAI Y, OHNO Y, MAEHASHI K, INOUE K, MATSUMOTO K
  • 作者关键词:  
  • 出版物名称:   JAPANESE JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-4922 EI 1347-4065
  • 通讯作者地址:   Osaka Univ
  • 被引频次:   0
  • DOI:   10.7567/JJAP.54.06FF11
  • 出版年:   2015

▎ 摘  要

We have succeeded in enhancing the gas sensitivity of graphene field-effect transistor (FET)-based gas sensors using surface-treated SiO2/Si substrates. Graphene FETs on SiO2 treated with three types of treatment, namely, H-2 annealing, Al2O3 coating, and CF4 reactive ion etching (CF4-RIE), were prepared. Enhanced sensitivities were obtained for graphene FETs on surface-treated SiO2 substrates compared with those on bare SiO2 substrates. Moreover, a distinct O-2 concentration dependence in O-2 sensing was observed for graphene FETs with different treatments. These results will lead to highly sensitive and concentration-optimized graphene-FET-based gas sensors. (C) 2015 The Japan Society of Applied Physics