• 文献标题:   Atomic Structure of Interconnected Few-Layer Graphene Domains
  • 文献类型:   Article
  • 作  者:   ROBERTSON AW, BACHMATIUK A, WU YMA, SCHAFFEL F, RELLINGHAUS B, BUCHNER B, RUMMELI MH, WARNER JH
  • 作者关键词:   graphene, chemical vapor deposition, cvd, aberrationcorrected tem, grain boundary
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851
  • 通讯作者地址:   Univ Oxford
  • 被引频次:   63
  • DOI:   10.1021/nn202051g
  • 出版年:   2011

▎ 摘  要

The atomic structure at the boundary interface between interconnected few-layer graphene (FIG) domains, synthesized by atmospheric pressure 'chemical vapor deposition (AP-CVD), is examined using aberration-corrected high-resolution transmission electron microscopy. Moire patterns in the HRTEM images reveal the presence of rotational stacking. faults in the boundary region that extend over distances of similar to 100 nm. We show that FIG domains Interconnect via two principle processes: graphene sheets from one domain grow over the top of a neighboring domain, while other graphene domains interconnect by direct atomic bonding. Differentiating between these two types of interconnects was found to be possible by examining the HRTEM contrast profiles produced at the Interface. Graphene sheets that terminate were found to produce strong edge contrast with Increasing defocus values, as well as a broader edge cross sect-ion, whereas atomically bonded interfaces were found to not exhibit any contrast, even under large defocus values. These findings are reinforced by correlating with multi-slice TEM image simulations of appropriate structures.