• 文献标题:   Multifinger Embedded T-Shaped Gate Graphene RF Transistors With High f(MAX)/f(T) Ratio
  • 文献类型:   Article
  • 作  者:   HAN SJ, OIDA S, JENKINS KA, LU D, ZHU Y
  • 作者关键词:   cvd graphene, f max, graphene, multiple finger, mushroom gate, radio frequency rf, tshaped gate, transistor
  • 出版物名称:   IEEE ELECTRON DEVICE LETTERS
  • ISSN:   0741-3106 EI 1558-0563
  • 通讯作者地址:   IBM TJ Watson Res Ctr
  • 被引频次:   10
  • DOI:   10.1109/LED.2013.2276038
  • 出版年:   2013

▎ 摘  要

Gate resistance plays a key role in determining the maximum oscillation frequency (f(MAX)) of all radio frequency transistors. This letter presents a new graphene device structure having multiple-finger T-shaped gates embedded in the substrate. The structure possesses several advantages over conventional top gate structures, including low gate resistance, low parasitic capacitance, scalable gate dielectric, and simple interconnect wiring. With 1 V drain bias, f(MAX) up to 20 GHz, and similar to 25%-43% higher than the current gain cutoff frequency (f(T)), is achieved from devices with a channel length down to 250 nm.