• 文献标题:   Quantification and minimization of disorder caused by focused electron beam induced deposition of cobalt on graphene
  • 文献类型:   Article
  • 作  者:   MICHALIK JM, RODDARO S, CASADO L, IBARRA MR, DE TERESA JM
  • 作者关键词:   graphene, electron beam induced deposition, raman spectroscopy, contamination, disorder
  • 出版物名称:   MICROELECTRONIC ENGINEERING
  • ISSN:   0167-9317
  • 通讯作者地址:   Univ Zaragoza
  • 被引频次:   4
  • DOI:   10.1016/j.mee.2010.12.002
  • 出版年:   2011

▎ 摘  要

Graphene has attracted a lot of attention due to its unique transport properties, including applications in Spintronics. Therefore, one of the key issues is the investigation of the spin polarized transport phenomena, which requires the use of magnetic contacts for electrical measurements. Here we present results of the micro-Raman spectroscopy and in situ transport measurements during the electron beam irradiation and electron beam induced deposition of metallic Co on graphene. We aim to understand the effects caused by the Co deposition on the graphene in order to minimize undesired deterioration and induced disorder. Annealing procedures have been also carried out to recover the initial graphene properties. (C) 2010 Elsevier B.V. All rights reserved.