• 文献标题:   The effect of residual gas scattering on Ga ion beam patterning of graphene
  • 文献类型:   Article
  • 作  者:   THISSEN NFW, VERVUURT RHJ, MULDERS JJL, WEBER JW, KESSELS WMM, BOL AA
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Eindhoven Univ Technol
  • 被引频次:   13
  • DOI:   10.1063/1.4936334
  • 出版年:   2015

▎ 摘  要

The patterning of grapheme by a 30 kV Ga-(+)focused ion beam (FIB) is studied by in-situ and ex-situ Raman spectroscopy. It is found that the graphene surrounding the patterned target area can be damaged at remarkably large distances of more than 10 pm. We show that scattering of the Ga ions in the residual gas of the vacuum system is the main cause of the large range of lateral damage, as the size and shape of the tail of the ion beam were strongly dependent on the system background pressure. The range of the damage was therefore greatly reduced by working- at low pressures and limiting the total amount of ions used. This makes FIB patterning a feasible alternative to electron beam lithography as long as residual gas scattering is taken into account. (C) 2015 AIP Publishing LLC.