• 文献标题:   Large-Area Bernal-Stacked Bilayer Graphene Film on a Uniformly Rough Cu Surface via Chemical Vapor Deposition
  • 文献类型:   Article
  • 作  者:   SON M, JANG J, KIM GH, LEE JH, CHUN DW, BAE JH, KIM IS, HAM MH, CHEE SS
  • 作者关键词:   bilayer graphene, bernalstacking, bandgap, ch4 preannealing, uniformly rough cu surface, diffusion barrier
  • 出版物名称:   ACS APPLIED ELECTRONIC MATERIALS
  • ISSN:  
  • 通讯作者地址:  
  • 被引频次:   2
  • DOI:   10.1021/acsaelm.0c00905 EA APR 2021
  • 出版年:   2021

▎ 摘  要

Herein, we introduced surface modification of a Cu catalyst by employing CH4 pre-annealing, which changed the uniformly rough Cu surface; this resulted in formation of high-quality and uniform Bernal-stacked bilayer graphene as well as monolayer graphene due to controlled synthesis time. A well-designed Cu surface was developed for synthesis of bilayer graphene with high coverage (>95%) and a high Bernal-stacking ratio (similar to 99%). Dual-gated transistors of Bernal-stacked bilayer graphene showed typical tunable transfer characteristics under varying gate voltages with carrier mobilities of 1000-2000 cm(2) V-1 s(-1). Through density functional theory calculations, we demonstrated that a uniformly rough Cu surface is favorable for synthesis of Bernal-stacked bilayer graphene. Finally, we employed bilayer graphene as a perfect diffusion barrier facilitated by complementing the diffusion pathway of numerous grain boundaries in graphene.