• 文献标题:   Formation and development of dislocation in graphene
  • 文献类型:   Article
  • 作  者:   LEE GD, YOON E, HWANG NM, WANG CZ, HO KM
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Seoul Natl Univ
  • 被引频次:   25
  • DOI:   10.1063/1.4775671
  • 出版年:   2013

▎ 摘  要

The formation and development processes of dislocation in graphene are investigated by performing tight-binding molecular dynamics (TBMD) simulation and ab initio total energy calculation. It is found that the coalescence of pentagon-heptagon (5-7) pairs with vacancy defects induces the formation of dislocation due to the separation of two 5-7 pairs. In TBMD simulations, adatoms are ejected and evaporated from graphene surface so that the dislocation is developed. It is observed that diffusing carbon atoms nearby dangling bonds help non-hexagonal rings change into stable hexagonal rings. These results might give some ideas for the control of structural properties by inducing defect structures. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4775671]