• 文献标题:   Temperature dependence of universal conductance fluctuation due to development of weak localization in graphene
  • 文献类型:   Article
  • 作  者:   TERASAWA D, FUKUDA A, FUJIMOTO A, OHNO Y, MATSUMOTO K
  • 作者关键词:   graphene, quantum interference, universal conductance fluctuation, weak localization
  • 出版物名称:   SOLID STATE COMMUNICATIONS
  • ISSN:   0038-1098 EI 1879-2766
  • 通讯作者地址:   Hyogo Coll Med
  • 被引频次:   2
  • DOI:   10.1016/j.ssc.2017.09.002
  • 出版年:   2017

▎ 摘  要

The temperature effect of quantum interference on resistivity is examined in monolayer graphene, with experimental results showing that the amplitude of the conductance fluctuation increases as temperature decreases. We find that this behavior can be attributed to the decrease in the inelastic scattering (dephasing) rate, which enhances the weak localization (WL) correction to resistivity. Following a previous report that explained the relationship between the universal conductance fluctuation (UCF) and WL regarding the gate voltage dependence (Terasawa et al., 2017) [19], we propose that the temperature dependence of the UCF in monolayer graphene can be interpreted by the WL theory.