• 文献标题:   MoS2 Field-Effect Transistors With Graphene/Metal Heterocontacts
  • 文献类型:   Article
  • 作  者:   DU YC, YANG LM, ZHANG JY, LIU H, MAJUMDAR K, KIRSCH PD, YE PDD
  • 作者关键词:   mos2, graphene, heterocontact, mosfet, schottky barrier height
  • 出版物名称:   IEEE ELECTRON DEVICE LETTERS
  • ISSN:   0741-3106 EI 1558-0563
  • 通讯作者地址:   Purdue Univ
  • 被引频次:   89
  • DOI:   10.1109/LED.2014.2313340
  • 出版年:   2014

▎ 摘  要

For the first time, n-type few-layer MoS2 field-effect transistors (FETs) with graphene/Ti as the heterocontacts have been fabricated, showing more than 160-mA/mm drain current at 1-mu m gate length with an ON-OFF current ratio of 10(7). The enhanced electrical characteristic is confirmed in a nearly 2.1 times improvement in ON-resistance and a 3.3 times improvement in contact resistance with heterocontacts compared with the MoS2 FETs without graphene contact layer. Temperature-dependent study on MoS2/graphene heterocontacts has been also performed, still unveiling its Schottky contact nature. Transfer length method and a devised I-V method have been introduced to study the contact resistance and Schottky barrier height in MoS2/graphene/metal heterocontacts structure.