• 文献标题:   Strain engineering on the electronic properties and interface contact of graphene/GeN3 van der Waals heterostructure
  • 文献类型:   Article
  • 作  者:   SHU Y, HE KJ, XIONG R, CUI Z, YANG XH, XU C, ZHENG JY, WEN CL, WU B, SA BS
  • 作者关键词:   graphene/gen3, schottky barrier, van der waals heterostructure, vertical strain, horizontal strain
  • 出版物名称:   APPLIED SURFACE SCIENCE
  • ISSN:   0169-4332 EI 1873-5584
  • 通讯作者地址:  
  • 被引频次:   4
  • DOI:   10.1016/j.apsusc.2022.154540 EA AUG 2022
  • 出版年:   2022

▎ 摘  要

Graphene-based van der Waals (vdW) heterostructures have shown great potential in electronic and optoelectronic nanodevices. Herein, we investigate the electronic property and Schottky barrier of graphene/GeN3 vdW heterostructure by first-principles calculations. It is noted that the electronic natures of graphene and GeN3 monolayers are well preserved in the heterostructure lattice due to the weak vdW interaction. Interestingly, the p-type Schottky contact in graphene/GeN3 heterostructure with a barrier height of 0.21 eV can be effectively tuned by both vertical and horizontal strains. Herein, the carrier concentration in the graphene layer reaches similar to 10(13) cm(-2) level by strain engineering. It is noteworthy that the designed optoelectronic field-effect transistor based on graphene/GeN3 heterostructure exhibits distinguished responsivity of 0.297 AW(-1) and impressive external quantum efficiency of 54.5% under illumination based on further non-equilibrium Green's function simulations. Our findings are of utmost significance for the metal-semiconductor vdW contact and corresponding applications in high-performance electronic and optoelectronic devices.