• 文献标题:   Monte Carlo Simulation of Ultrafast Electron Relaxation in Graphene
  • 文献类型:   Article
  • 作  者:   SANO E
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS EXPRESS
  • ISSN:   1882-0778
  • 通讯作者地址:   Hokkaido Univ
  • 被引频次:   13
  • DOI:   10.1143/APEX.4.085101
  • 出版年:   2011

▎ 摘  要

The relaxation process of photoexcited electrons in graphene is simulated by using a Monte Carlo method. A full-band treatment is used for the electron-phonon interaction, and an approximate treatment is used for the electron-electron interaction. The Monte Carlo simulations reveal an ultrafast relaxation of electrons with a time constant of about 20 fs, which is close to a recent experimental result. Despite the ultrafast relaxation of electrons, a population inversion for the photoexcited electron-hole system is expected. (C) 2011 The Japan Society of Applied Physics