• 文献标题:   Effect of interfacial defects on the electronic properties of graphene/g-GaN heterostructures
  • 文献类型:   Article
  • 作  者:   DENG ZX, WANG XH, CUI J
  • 作者关键词:  
  • 出版物名称:   RSC ADVANCES
  • ISSN:   2046-2069
  • 通讯作者地址:   Xian Univ Technol
  • 被引频次:   3
  • DOI:   10.1039/c9ra01576k
  • 出版年:   2019

▎ 摘  要

To gain deep insights into their interactions, the effects of interfacial defects on the structural and electronic properties of graphene/g-GaN heterostructures were investigated by using first-principles calculations. The graphene/g-GaN-V-Ga heterostructure maintains a p-type Schottky contact in the spin-up channel and the Schottky barrier height (SBH) is decreased to 0.332 eV, but there is not a metal/semiconductor contact in the spin-down channel. However, the n-type SBH is negative for the graphene/g-GaN-V-N heterostructure, indicating an ohmic contact. Furthermore, the SBH in the graphene/g-GaN heterostructure can be effectively modulated by the interlayer distance. The research could provide a strategy for the development and fabrication of efficient novel nanoelectronic devices.