• 文献标题:   Graphene-GaAs/AlxGa1-xAs heterostructure dual-function field-effect transistor
  • 文献类型:   Article
  • 作  者:   TANG CC, LI MY, LI LJ, CHI CC, CHEN JC
  • 作者关键词:   aluminium compound, chemical vapour deposition, gallium arsenide, graphene, high electron mobility transistor, iiiv semiconductor, integrated circuit, semiconductor heterojunction, surface morphology, twodimensional electron ga
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Natl Tsing Hua Univ
  • 被引频次:   17
  • DOI:   10.1063/1.4767387
  • 出版年:   2012

▎ 摘  要

We have integrated chemical vapor-deposited graphene and GaAs/Al(x)Ga1-As-x heterostructure into a hybrid field effect transistor (FET). Depending on the operation scheme, graphene can be utilized either as a gate electrode for a GaAs-based high electron mobility transistor (HEMT) or as a channel material gated by two dimensional electron gas (2DEG) formed in the interface of a heterojunction. Our studies reveal that 2DEG can function as an effective back-electrode to tune the ambipolar effect of graphene. The performance of graphene FET (GFET) is limited by the interface band bending of the heterojunction associated with the gating voltages and the intrinsic surface morphology of GaAs substrate. Our results bode a way to implement HEMT/GEFT-based bi-FET integrated circuits. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4767387]