• 文献标题:   Formation of nitrogen-vacancy complexes during plasma-assisted nitrogen doping of epitaxial graphene on SiC(0001)
  • 文献类型:   Article
  • 作  者:   RHIM SH, QI Y, LIU Y, WEINERT M, LI L
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951 EI 1077-3118
  • 通讯作者地址:   Univ Wisconsin
  • 被引频次:   12
  • DOI:   10.1063/1.4726281
  • 出版年:   2012

▎ 摘  要

Doping epitaxial graphene on SiC(0001) using nitrogen plasma leads to N-vacancy complexes. Based on the calculated energetics by density functional theory and comparison with scanning tunneling microscopy observations, the most probable configuration is determined to be a nonmagnetic complex consisting of substitutional nitrogen next to a carbon vacancy. Further calculations show that other N-vacancy complexes, where the substituted N and the vacancy are the second and third nearest neighbors, do exhibit localized moments. These results indicate that the electronic and magnetic properties of graphene can be further tailored by plasma-assisted nitrogen doping. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4726281]