• 文献标题:   Imaging Stacking Order in Few-Layer Graphene
  • 文献类型:   Article
  • 作  者:   LUI CH, LI ZQ, CHEN ZY, KLIMOV PV, BRUS LE, HEINZ TF
  • 作者关键词:   graphene, trilayer, few layer, stacking order, raman
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Columbia Univ
  • 被引频次:   219
  • DOI:   10.1021/nl1032827
  • 出版年:   2011

▎ 摘  要

Few-layer graphene (FLG) has been predicted to exist in various crystallographic stacking sequences, which can strongly influence the material's electronic properties. We demonstrate an accurate and efficient method to characterize stacking order in FLG using the distinctive features of the Raman 20-mode. Raman imaging allows us to visualize directly the spatial distribution of Bernal (ABA) and rhombohedral (ABC) stacking in tri- and tetralayer graphene. We find that 15% of exfoliated graphene tri- and tetralayers is composed of micrometer-sized domains of rhombohedral stacking, rather than of usual Bernal stacking. These domains are stable and remain unchanged for temperatures exceeding 800 degrees C.