• 文献标题:   Growth behavior of Bi2Te3 and Sb2Te3 thin films on graphene substrate grown by plasma-enhanced chemical vapor deposition
  • 文献类型:   Article
  • 作  者:   LEE CW, KIM GH, KANG SG, KANG MA, AN KS, KIM H, LEE YK
  • 作者关键词:   twodimensional material, bi2te3, sb2te3, graphene, plasmaenhanced chemical vapor deposition
  • 出版物名称:   PHYSICA STATUS SOLIDIRAPID RESEARCH LETTERS
  • ISSN:   1862-6254 EI 1862-6270
  • 通讯作者地址:   Korea Res Inst Chem Technol
  • 被引频次:   3
  • DOI:   10.1002/pssr.201600369
  • 出版年:   2017

▎ 摘  要

A comparative study of the substrate effect on the growth mechanism of chalcogenide Bi2Te3 and Sb2Te3 thin films was carried out. Obvious microstructural discrepancy in both the as-deposited Bi2Te3 and Sb2Te3 thin films was observed when grown on graphene or SiO2/Si substrate. Bi2Te3 and Sb2Te3 thin films deposited on the graphene substrate were observed to be grown epitaxially along c-axis and show very smooth surface compared to that on SiO2/Si substrate. Based on the experimental results of this study, the initial adsorption sites on graphene substrate during deposition process, which had been discussed theoretically, could be demonstrated empirically.