• 文献标题:   Corrosion behavior of Cu during graphene growth by CVD
  • 文献类型:   Article
  • 作  者:   DONG YH, LIU QQ, ZHOU Q
  • 作者关键词:   copper, eis, sem
  • 出版物名称:   CORROSION SCIENCE
  • ISSN:   0010-938X EI 1879-0496
  • 通讯作者地址:   China Univ Petr
  • 被引频次:   25
  • DOI:   10.1016/j.corsci.2014.08.026
  • 出版年:   2014

▎ 摘  要

The corrosion performance of Cu samples may be affected by annealing at high temperatures during graphene growth via the chemical vapor deposition method. In this study, multiple graphene films were deposited on Cu and characterized by Raman spectroscopy and transmission electron microscopy. The corrosion behavior of Cu immersed in 3.5 wt.% NaCl solution was investigated using electrochemical impedance spectroscopy. The Cu morphology was observed by optical microscopy and scanning electron microscopy. Results indicated that annealing affects the corrosion process of Cu. The presence of graphene films on the Cu substrate improved the corrosion performance of the material for a short period of time. (C) 2014 Elsevier Ltd. All rights reserved.