• 文献标题:   Field-Effect Tunneling Transistor Based on Vertical Graphene Heterostructures
  • 文献类型:   Article
  • 作  者:   BRITNELL L, GORBACHEV RV, JALIL R, BELLE BD, SCHEDIN F, MISHCHENKO A, GEORGIOU T, KATSNELSON MI, EAVES L, MOROZOV SV, PERES NMR, LEIST J, GEIM AK, NOVOSELOV KS, PONOMARENKO LA
  • 作者关键词:  
  • 出版物名称:   SCIENCE
  • ISSN:   0036-8075 EI 1095-9203
  • 通讯作者地址:   Univ Manchester
  • 被引频次:   1545
  • DOI:   10.1126/science.1218461
  • 出版年:   2012

▎ 摘  要

An obstacle to the use of graphene as an alternative to silicon electronics has been the absence of an energy gap between its conduction and valence bands, which makes it difficult to achieve low power dissipation in the OFF state. We report a bipolar field-effect transistor that exploits the low density of states in graphene and its one-atomic-layer thickness. Our prototype devices are graphene heterostructures with atomically thin boron nitride or molybdenum disulfide acting as a vertical transport barrier. They exhibit room-temperature switching ratios of approximate to 50 and approximate to 10,000, respectively. Such devices have potential for high-frequency operation and large-scale integration.