• 文献标题:   High-Quality Electrostatically Defined Hall Bars in Monolayer Graphene
  • 文献类型:   Article
  • 作  者:   RIBEIROPALAU R, CHEN SW, ZENG YH, WATANABE K, TANIGUCHI T, HONE J, DEAN CR
  • 作者关键词:   graphene, fractional quantum hall effect, gatedefined structure, disorder
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Columbia Univ
  • 被引频次:   3
  • DOI:   10.1021/acs.nanolett.9b00351
  • 出版年:   2019

▎ 摘  要

Realizing graphene's promise as an atomically thin and tunable platform for fundamental studies and future applications in quantum transport requires the ability to electrostatically define the geometry of the structure and control the carrier concentration, without compromising the quality of the system. Here, we demonstrate the working principle of a new generation of high-quality gate-defined graphene samples, where the challenge of doing so in a gapless semiconductor is overcome by using the nu = 0 insulating state, which emerges at modest applied magnetic fields. In order to verify that the quality of our devices is not compromised, we compare the electronic transport response of different sample geometries, paying close attention to fragile quantum states, such as the fractional quantum Hall states that are highly susceptible to disorder. The ability to define local depletion regions without compromising device quality establishes a new approach toward structuring graphene-based quantum transport devices.