• 文献标题:   A Fitting Model for Asymmetric I-V Characteristics of Graphene FETs for Extraction of Intrinsic Mobilities
  • 文献类型:   Article
  • 作  者:   SATOU A, TAMAMUSHI G, SUGAWARA K, MITSUSHIO J, RYZHII V, OTSUJI T
  • 作者关键词:   fitting of iv characteristic, graphene fet gfet, interband tunneling, intrinsic mobility, thermionic emission
  • 出版物名称:   IEEE TRANSACTIONS ON ELECTRON DEVICES
  • ISSN:   0018-9383 EI 1557-9646
  • 通讯作者地址:   Tohoku Univ
  • 被引频次:   6
  • DOI:   10.1109/TED.2016.2578325
  • 出版年:   2016

▎ 摘  要

A fitting model is developed for accounting the asymmetric ambipolarities in the I-V characteristics of graphene FETs (G-FETs) with doped channels, originating from the thermionic emission and interband tunneling at the junctions between the gated and access regions. Using the model, the gate-voltage-dependent intrinsic mobility as well as other intrinsic and extrinsic device parameters can be extracted. We apply it to a top-gated G-FET with a graphene channel grown on a SiC substrate and with SiN gate dielectric that we reported previously, and we demonstrate that it can excellently fit its asymmetric I-V characteristic.