• 文献标题:   Top-gated graphene field-effect transistors on SiC substrates
  • 文献类型:   Article
  • 作  者:   MA P, JIN Z, GUO JN, PAN HL, LIU XY, YE TC, JIA YP, GUO LW, CHEN XL
  • 作者关键词:   graphene, radio frequency rf, fieldeffect transistor fet, sic
  • 出版物名称:   CHINESE SCIENCE BULLETIN
  • ISSN:   1001-6538 EI 1861-9541
  • 通讯作者地址:   Chinese Acad Sci
  • 被引频次:   2
  • DOI:   10.1007/s11434-012-5206-z
  • 出版年:   2012

▎ 摘  要

We report on a demonstration of top-gated graphene field-effect transistors (FETs) fabricated on epitaxial SiC substrate. Composite stacks, benzocyclobutene and atomic layer deposition Al2O3, are used as the gate dielectrics to maintain intrinsic carrier mobility of graphene. All graphene FETs exhibit n-type transistor characteristics and the drain current is nearly linear dependence on gate and drain voltages. Despite a low field-effect mobility of 40 cm(2)/(V s), a maximum cutoff frequency of 4.6 GHz and a maximum oscillation frequency of 1.5 GHz were obtained for the graphene devices with a gate length of 1 mu m.