• 文献标题:   Graphene nanoribbon tunnel field effect transistor with lightly doped drain: Numerical simulations
  • 文献类型:   Article
  • 作  者:   GHOREISHI SS, SAGHAFI K, YOUSEFI R, MORAVVEJFARSHI MK
  • 作者关键词:   graphene nanoribbon gnr, tunneling field effect transistor tfet, non equilibrium green s function negf, band to band tunneling btbt, drain induced barrier thinning dibt, ambipolarity
  • 出版物名称:   SUPERLATTICES MICROSTRUCTURES
  • ISSN:   0749-6036
  • 通讯作者地址:   Islamic Azad Univ
  • 被引频次:   12
  • DOI:   10.1016/j.spmi.2014.07.042
  • 出版年:   2014

▎ 摘  要

By inserting a lightly doped region between the highly doped drain and the intrinsic channel of a graphene nanoribbon tunnel field effect transistor (GNR-TFET), we propose a new lightly doped drain (LDD)-GNR-TFET. Transport characteristics of the proposed transistor is numerically simulated, employing the third-nearest-neighbor tight-binding approximation in mode space non-equilibrium Green's function formulism (NEGF), in ballistic regime. Simulations show, in comparison with a conventional GNR-TFET of the same dimensions, the proposed LDD-GNR-TFET exhibits a 10(2)-10(3) times smaller OFF-current, an up to 10(5) times larger ON/OFF ratio, a shorter time delay, a smaller power-delay product (PDP) and a less drain induced barrier thinning (DIBT), besides preserving the subthreshold swing. (C) 2014 Elsevier Ltd. All rights reserved.