• 文献标题:   Disorder density of states in supported graphene
  • 文献类型:   Article
  • 作  者:   SINHA D, LEE JU
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-8979 EI 1089-7550
  • 通讯作者地址:   SUNY Albany
  • 被引频次:   0
  • DOI:   10.1063/1.4893548
  • 出版年:   2014

▎ 摘  要

Transport in graphene is impacted by disorder. Disorder, which can occur on supported graphene, manifests as a significant shift in the Fermi level position from the charge neutrality point (Dirac point) and leads to carrier scattering. Here, we provide a direct measurement of the disorder density of states (DOS). We show that the disorder is extrinsic to graphene and is characterized by a continuum of DOS located at the graphene-substrate interface. A key feature is a Gaussian-like DOS that causes pinning of the Fermi level and the shift in the Dirac point. (C) 2014 AIP Publishing LLC.