• 文献标题:   Graphene transfer methods: A review
  • 文献类型:   Review
  • 作  者:   ULLAH S, YANG XQ, TA HQ, HASAN M, BACHMATIUK A, TOKARSKA K, TRZEBICKA B, FU L, RUMMELI MH
  • 作者关键词:   highquality transfer, applicationcompatible substrate, graphene technology
  • 出版物名称:   NANO RESEARCH
  • ISSN:   1998-0124 EI 1998-0000
  • 通讯作者地址:  
  • 被引频次:   62
  • DOI:   10.1007/s12274-021-3345-8 EA FEB 2021
  • 出版年:   2021

▎ 摘  要

Graphene is a material with unique properties that can be exploited in electronics, catalysis, energy, and bio-related fields. Although, for maximal utilization of this material, high-quality graphene is required at both the growth process and after transfer of the graphene film to the application-compatible substrate. Chemical vapor deposition (CVD) is an important method for growing high-quality graphene on non-technological substrates (as, metal substrates, e.g., copper foil). Thus, there are also considerable efforts toward the efficient and non-damaging transfer of quality of graphene on to technologically relevant materials and systems. In this review article, a range of graphene current transfer techniques are reviewed from the standpoint of their impact on contamination control and structural integrity preservation of the as-produced graphene. In addition, their scalability, cost- and time-effectiveness are discussed. We summarize with a perspective on the transfer challenges, alternative options and future developments toward graphene technology.