• 文献标题:   Edge-terminated MoS2 nanosheets with an expanded interlayer spacing on graphene to boost supercapacitive performance
  • 文献类型:   Article
  • 作  者:   SUN HH, LIU HY, HOU ZD, ZHOU R, LIU XR, WANG JG
  • 作者关键词:   mos2@graphene nanoarchitecture, edgeterminated mos2 nanosheet, expanded interlayer spacing, supercapacitor
  • 出版物名称:   CHEMICAL ENGINEERING JOURNAL
  • ISSN:   1385-8947 EI 1873-3212
  • 通讯作者地址:   Northwestern Polytech Univ
  • 被引频次:   11
  • DOI:   10.1016/j.cej.2020.124204
  • 出版年:   2020

▎ 摘  要

The supercapacitive performance of two-dimensional (2D) MoS2 nanomaterials strongly depends on the interlayer spacing and edge orientation, which remains a formidable challenge. Herein, we demonstrate a sheet-onsheet 2D heterostructure with edge-terminated and interlayer-expanded MoS2 few-layered nanosheets on graphene. The preferential (0 0 2) edge orientation with an expanded interlayer spacing of 0.98 nm enables easy insertion of ions into the MoS2 nanosheets. The intimate connection with conducive graphene further expedites the electrochemical kinetics by promoting electron/ion transport and structural stability. As a result, the MoS2@ graphene nanoarchitecture can deliver a high specific capacitance of 428 F g(-1) at 1 A g(-1) along with superior rate and long-term durability, which is among the best performance reported so far. The present work highlights the importance of engineering edge-oriented and interlayer-expanded 2D materials for their promising use to-ward high-performance supercapacitors.