• 文献标题:   Performance of chemical vapor deposition fabricated graphene absorber mirror in Yb3+ : Sc2SiO5 mode-locked laser
  • 文献类型:   Article
  • 作  者:   CAI W, LI YQ, ZHU HT, JIANG SZ, XU SC, LIU J, ZHENG LH, SU LB, XU J
  • 作者关键词:   graphene saturable absorber mirror, passively modelocked laser, diodepumped, yb3+: sc2sio5 crystal
  • 出版物名称:   OPTICAL ENGINEERING
  • ISSN:   0091-3286 EI 1560-2303
  • 通讯作者地址:   Shandong Normal Univ
  • 被引频次:   7
  • DOI:   10.1117/1.OE.53.12.126103
  • 出版年:   2014

▎ 摘  要

A reflective graphene saturable absorber mirror (SAM) was successfully fabricated by chemical vapor deposition technology. A stable diode-pumped passively mode-locked Yb3+: Sc2SiO5 laser using a graphene SAM as a saturable absorber was accomplished for the first time. The measured average output power amounts to 351 mW under the absorbed pump power of 12.5 W. Without prisms compensating for dispersion, the minimum pulse duration of 7 ps with a repetition rate of 97 MHz has been obtained at the central wavelength of 1063 nm. The corresponding peak power and the maximum pulse energy were 516 W and 3.6 nJ, respectively. (C) 2014 Society of Photo-Optical Instrumentation Engineers (SPIE)