• 文献标题:   Contracted interlayer distance in graphene/sapphire heterostructure
  • 文献类型:   Article
  • 作  者:   ENTANI S, ANTIPINA LY, AVRAMOV PV, OHTOMO M, MATSUMOTO Y, HIRAO N, SHIMOYAMA I, NARAMOTO H, BABA Y, SOROKIN PB, SAKAI S
  • 作者关键词:   graphene, sapphire, chemical vapor deposition, graphene/insulator interface
  • 出版物名称:   NANO RESEARCH
  • ISSN:   1998-0124 EI 1998-0000
  • 通讯作者地址:   Japan Atom Energy Agcy
  • 被引频次:   19
  • DOI:   10.1007/s12274-014-0640-7
  • 出版年:   2015

▎ 摘  要

Direct growth of graphene on insulators is expected to yield significant improvements in performance of graphene-based electronic and spintronic devices. In this study, we successfully reveal the atomic arrangement and electronic properties of a coherent heterostructure of single-layer graphene and alpha-Al2O3(0001). The analysis of the atomic arrangement of single-layer graphene on alpha-Al2O3(0001) revealed an apparentcontradiction. The in-plane analysis shows that single-layer graphene grows not in a single-crystalline epitaxial manner, but rather in polycrystalline form, with two strongly pronounced preferred orientations. This suggests relatively weak interfacial interactions are operative. However, we demonstrate that unusually strong physical interactions between graphene and alpha-Al2O3(0001) exist, as evidenced by the small separation between the graphene and the alpha-Al2O3(0001) surface. The interfacial interaction is shown to be dominated by the electrostatic forces involved in the graphene pi-system and the unsaturated electrons of the topmost O layer of alpha-Al2O3(0001), rather than the van der Waals interactions. Such features causes graphene hole doping and enable the graphene to slide on the alpha-Al2O3(0001) surface with only a small energy barrier despite the strong interfacial interactions.