• 文献标题:   The Effect of Low Energy Nitrogen Ion Implantation on Graphene Nanosheets
  • 文献类型:   Article
  • 作  者:   MISHRA M, ALWARAPPAN S, KANJILAL D, MOHANTY T
  • 作者关键词:   graphene nanosheet, low energy ion implantation, fluence, defect concentration
  • 出版物名称:   ELECTRONIC MATERIALS LETTERS
  • ISSN:   1738-8090 EI 2093-6788
  • 通讯作者地址:   Jawaharlal Nehru Univ
  • 被引频次:   2
  • DOI:   10.1007/s13391-018-0046-x
  • 出版年:   2018

▎ 摘  要

Herein, we report the effect 50 keV nitrogen ion implantation at varying fluence on the optical properties of graphene nanosheets (number of layers < 5). Initially, graphene nanosheets synthesized by the direct liquid exfoliation of graphite layers were deposited on a cleaned Si-substrate by drop cast method. These graphene nanosheets are implanted with 50 keV nitrogen-ion beam at six different fluences. Raman spectroscopic results show that the D, D' and G peak get broadened up to the nitrogen ion fluence of 1 x 10(15) ions/cm(2), while 2D peak of graphene nanosheets disappeared for nitrogen-ions have fluence more than 10(14) ions/cm(2). However, further increase of fluence causes the indistinguishable superimposition of D, D' and G peaks. Surface contact potential value analysis for ion implanted graphene nanosheets shows the increase in defect concentration from 1.15 x 10(12) to 1.98 x 10(14) defects/cm(2) with increasing the nitrogen ion fluence, which resembles the Fermi level shift towards conduction band. XRD spectra confirmed that the crystallinity of graphene nanosheets was found to tamper with increasing fluence. These results revealed that the limit of nitrogen ion implantation resistant on the vibrational behaviors for graphene nanosheets was 10(15) ions/cm(2) that opens up the scope of application of graphene nanosheets in device fabrication for ion-active environment and space applications. [GRAPHICS]