• 文献标题:   Improved efficiency of graphene/Si Schottky junction solar cell based on back contact structure and DUV treatment
  • 文献类型:   Article
  • 作  者:   SUHAIL A, PAN GH, JENKINS D, ISLAM K
  • 作者关键词:   graphene/si schottky junction solar cell, sshaped kink, deep uv treatment, texturing proces
  • 出版物名称:   CARBON
  • ISSN:   0008-6223 EI 1873-3891
  • 通讯作者地址:   Plymouth Univ
  • 被引频次:   13
  • DOI:   10.1016/j.carbon.2017.12.053
  • 出版年:   2018

▎ 摘  要

A graphene/Si Schottky junction solar cell is commonly fabricated by using the top-window structure. However, reported devices have many drawbacks such as a small active area of 0.11 cm(2), s-shape in the J-V curves, recombination process of charge carriers at the graphene/textured Si interface, high cost and a complex fabrication process. Here, we report a novel graphene/Si Schottky junction solar cell with a back contact-structure, which has benefits of a simpler fabrication process, lower fabrication cost, and larger active area in comparison with a device fabricated with the previous structure. Additionally, we found that the PMMA residue left on graphene surfaces is the key to eliminate the s-shape in the J-V curves. Thus, the deep UV treatment of the CVD graphene is applied within the wet transfer process to effectively remove the PMMA residue, suppress the behavior of s-shaped kink in J-V curves and enhance the solar cell efficiency. As a result, the recorded power conversion efficiency of 10% is achieved for graphene/ textured Si devices without chemical doping and anti-reflection coating, and this value is improved to 14.1% after applying chemical doping. Doped devices also show great stability and retain 84% of the efficiency after 9 days storage in air. (C) 2018 The Authors. Published by Elsevier Ltd.