• 文献标题:   Modification of graphene properties due to electron-beam irradiation
  • 文献类型:   Article
  • 作  者:   TEWELDEBRHAN D, BALANDIN AA
  • 作者关键词:   amorphisation, electron beam effect, focused ion beam technology
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   Univ Calif Riverside
  • 被引频次:   320
  • DOI:   10.1063/1.3062851
  • 出版年:   2009

▎ 摘  要

The authors report micro-Raman investigation of changes in the single and bilayer graphene crystal lattice induced by the low and medium energy electron-beam irradiation (5-20 keV). It was found that the radiation exposures result in the appearance of the strong disorder D band around 1345 cm(-1), indicating damage to the lattice. The D and G peak evolution with increasing radiation dose follows the amorphization trajectory, which suggests graphene's transformation to the nanocrystalline and then to amorphous form. The results have important implications for graphene characterization and device fabrication, which rely on the electron microscopy and focused ion beam processing.