• 文献标题:   Field effect in chemical vapour deposited graphene incorporating a polymeric gate dielectric
  • 文献类型:   Article
  • 作  者:   TAN YY, TAN LW, JAYAWARDENA KDGI, ANGUITA JV, CAREY JD, SILVA SRP
  • 作者关键词:   chemical vapour deposition, graphene, transistor, polymeric gate
  • 出版物名称:   SYNTHETIC METALS
  • ISSN:   0379-6779
  • 通讯作者地址:   Univ Surrey
  • 被引频次:   3
  • DOI:   10.1016/j.synthmet.2011.08.029
  • 出版年:   2011

▎ 摘  要

We have investigated the room temperature long channel field effect characteristics of a single graphene layer transistor incorporating a poly-4-vinyl-phenol (PVP) organic insulating layer, as an alternative to conventional oxide gate dielectric materials. High purity copper foils were used in the chemical vapour growth of the graphene layer and visible Raman analysis confirmed the presence of a high quality monolayer carbon film. Using a channel length of 50 mu m, a field effect hole mobility of 37 cm(2)/Vs was calculated, which demonstrates the possibility of an all carbon graphene based large area transistor with carrier mobilities above those found in conventional long channel all organic electronic transistors. (C) 2011 Elsevier B.V. All rights reserved.