• 文献标题:   Impact of germanium substrate orientation on morphological and structural properties of graphene grown by CVD method
  • 文献类型:   Article
  • 作  者:   SITEK J, PASTERNAK I, GRZONKA J, SOBIESKI J, JUDEK J, DABROWSKI P, ZDROJEK M, STRUPINSKI W
  • 作者关键词:   graphene, germanium, cvd, crystallographic orientation, surface reconstruction, raman spectroscopy
  • 出版物名称:   APPLIED SURFACE SCIENCE
  • ISSN:   0169-4332 EI 1873-5584
  • 通讯作者地址:   Warsaw Univ Technol
  • 被引频次:   2
  • DOI:   10.1016/j.apsusc.2019.143913
  • 出版年:   2020

▎ 摘  要

In this paper we study graphene synthesized on undoped (001), (110), and (111) Ge substrates, and show how the surface orientation and reconstruction affect its morphological and structural properties. The article presents the first attempt to explain the impact of germanium surface reconstruction on the shape and the density of graphene nuclei as well as on the material's stress and doping levels. Our findings suggest that graphene obtained on Ge(001) is the most uniform, with low doping (1.5 x 10(12) cm(-2)) and low strain level ( - 0.1%). Graphene on Ge(110) appears to be highly compressed ( - 0.5%) while graphene on Ge(111) exhibits doping reaching 5 x 10(13) cm(-2). These results help to better understand the dynamics of graphene growth on germanium and indicate Ge(001), in terms of its structural properties, as the most promising orientation for the future CMOS applications.