• 文献标题:   Significant photoelectrical response of epitaxial graphene grown on Si-terminated 6H-SiC
  • 文献类型:   Article
  • 作  者:   HAO X, CHEN YF, WANG ZG, LIU JB, HE JR, LI YR
  • 作者关键词:   epitaxial graphene, photoelectrical response, oxygen absorption
  • 出版物名称:   CHINESE PHYSICS B
  • ISSN:   1674-1056 EI 1741-4199
  • 通讯作者地址:   Univ Elect Sci Technol China
  • 被引频次:   1
  • DOI:   10.1088/1674-1056/22/7/076804
  • 出版年:   2013

▎ 摘  要

Photoelectrical response characteristics of epitaxial graphene (EG) films on Si-and C-terminated 6H-SiC, and transferred chemical vapor deposition (CVD) graphene films on Si-terminated 6H-SiC have been investigated. The results show that upon illumination by a xenon lamp, the photocurrent of EG grown on Si-terminated SiC significantly increases by 147.6%, while the photocurrents of EG grown on C-terminated SiC, and transferred CVD graphene on Si-terminated SiC slightly decrease by 0.5% and 2.7%, respectively. The interfacial buffer layer between EG and Si-terminated 6H-SiC is responsible for the significant photoelectrical response of EG. Its strong photoelectrical response makes it promising for optoelectronic applications.