• 文献标题:   Step-flow growth of graphene-boron nitride lateral heterostructures by molecular beam epitaxy
  • 文献类型:   Article
  • 作  者:   THOMAS J, BRADFORD J, CHENG TS, SUMMERFIELD A, WRIGLEY J, MELLOR CJ, KHLOBYSTOV AN, FOXON CT, EAVES L, NOVIKOV SV, BETON PH
  • 作者关键词:   growth, molecular beam epitaxy, lateral heterostructure
  • 出版物名称:   2D MATERIALS
  • ISSN:   2053-1583
  • 通讯作者地址:   Univ Nottingham
  • 被引频次:   1
  • DOI:   10.1088/2053-1583/ab89e7
  • 出版年:   2020

▎ 摘  要

Integration of graphene and hexagonal boron nitride (hBN) into lateral heterostructures has drawn focus due to the ability to broadly engineer the material properties. Hybrid monolayers with tuneable bandgaps have been reported, while the interface itself possesses unique electronic and magnetic qualities. Herein, we demonstrate lateral heteroepitaxial growth of graphene and hBN by sequential growth using high-temperature molecular beam epitaxy (MBE) on highly oriented pyrolytic graphite (HOPG). We find, using scanning probe microscopy, that graphene growth nucleates at hBN step edges and grows across the surface to form nanoribbons with a controlled width that is highly uniform across the surface. The graphene nanoribbons grow conformally from the armchair edges of hexagonal hBN islands forming multiply connected regions with the growth front alternating from armchair to zigzag in regions nucleated close to the vertices of hexagonal hBN islands. Images with lattice resolution confirm a lateral epitaxial alignment between the hBN and graphene nanoribbons, while the presence of a moire pattern within the ribbons indicates that some strain relief occurs at the lateral heterojunction. These results demonstrate that high temperature MBE is a viable route towards integrating graphene and hBN in lateral heterostructures.