• 文献标题:   Chemical etching of copper foils for single-layer graphene growth by chemical vapor deposition
  • 文献类型:   Article
  • 作  者:   YOSHIHARA N, NODA M
  • 作者关键词:   chemical etching, singlelayer graphene, chemical vapor deposition, copper foil, surface morphology
  • 出版物名称:   CHEMICAL PHYSICS LETTERS
  • ISSN:   0009-2614 EI 1873-4448
  • 通讯作者地址:   Fukuoka Univ
  • 被引频次:   6
  • DOI:   10.1016/j.cplett.2017.07.035
  • 出版年:   2017

▎ 摘  要

Chemical etching on copper surface is essential as a pre-treatment for single-layer graphene growth by chemical vapor deposition (CVD). Here, we investigated the effect of chemical etching treatment on copper foils for single-layer graphene CVD growth. The chemical etching conditions, such as the type of chemical etchants and the treatment time, were found to strongly influence the graphene domain size. Moreover, a drastic change in the layer structure of graphene sheets, which was attributed to the surface morphology of the etched copper foil, was confirmed by graphene transmittance and Raman mapping measurements. (C) 2017 Elsevier B.V. All rights reserved.