▎ 摘　　要

The epitaxial growth of graphene on the Ag(001) surface via chemical vapor deposition (CVD) of propene and via liquid precursor deposition (LPD) by ex situ rinsing with acetone is investigated by X-ray photoelectron spectroscopy (XPS), low energy electron diffraction (LEED), and Fermi surface mapping (FSM). In case of LPD, the growth of graphene is quite similar to that previously obtained for h-BN monolayers on the same surface. The weak interaction between the graphene layer and the Ag(001) surface prevents a preferred alignment of the graphene lattice, leading to graphene domains with statistically distributed azimuthal orientations. In contrast to the LPD method, it is not possible to provide any carbon via the standard CVD technique. The present results give evidence that LPD represents a promising alternative for the growth of graphene, especially on weakly interacting surfaces. (C) 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim