• 文献标题:   Chemical instability of graphene oxide following exposure to highly reactive radicals in advanced oxidation processes
  • 文献类型:   Article
  • 作  者:   WANG ZH, SUN LY, LOU XY, YANG F, FENG M, LIU JS
  • 作者关键词:   graphene oxide, sulfate radical, hydroxyl radical, decomposition, advanced oxidation processe
  • 出版物名称:   JOURNAL OF COLLOID INTERFACE SCIENCE
  • ISSN:   0021-9797 EI 1095-7103
  • 通讯作者地址:   Donghua Univ
  • 被引频次:   7
  • DOI:   10.1016/j.jcis.2017.07.105
  • 出版年:   2017

▎ 摘  要

The rapidly increasing and widespread use of graphene oxide (GO) as catalyst supports, requires further understanding of its chemical stability in advanced oxidation processes (AOPs). In this study, UV/H2O2 and UV/persulfate (UV/PS) processes were selected to test the chemical instability of GO in terms of their performance in producing highly reactive hydroxyl radicals ((OH)-O-center dot) and sulfate radicals (SO4 center dot-), respectively. The degradation intermediates were characterized using UVvisible absorption spectra (UVvis), X-ray photoelectron spectroscopy (XPS), transmission electron microscopy (TEM), Raman spectroscopy, and matrix-assisted laser desorption and ionization time-of-flight mass spectrometry (MALDI-TOF-MS). Experimental data indicate that UV/PS process was more effective in enhancing GO degradation than the UV/H2O2 system. The overall oxygen-containing functionalities (e.g. C-O, C=O and O-C=O groups) dramatically declined. After radical attack, sheet-like GO was destructed into lots of flakes and some low-molecular-weight molecules were detected. The results suggest GO is most vulnerable against SO4 center dot- radical attack, which deserves special attention while GO acts as a catalyst support or even as a catalyst itself. Therefore, stability of GO and its derivatives should be carefully assessed before they are applied to SO4 center dot- based AOPs. (C) 2017 Elsevier Inc. All rights reserved.