• 文献标题:   Effects of Hydrogen Partial Pressure in the Annealing Process on Graphene Growth
  • 文献类型:   Article
  • 作  者:   JUNG DH, KANG C, KIM M, CHEONG H, LEE H, LEE JS
  • 作者关键词:  
  • 出版物名称:   JOURNAL OF PHYSICAL CHEMISTRY C
  • ISSN:   1932-7447 EI 1932-7455
  • 通讯作者地址:   Sookmyung Womens Univ
  • 被引频次:   27
  • DOI:   10.1021/jp410961m
  • 出版年:   2014

▎ 摘  要

Graphene domains with different sizes and densities were successfully grown on Cu foils with use of a chemical vapor deposition method. We investigated the effects of volume ratios of argon to hydrogen during the annealing process on graphene growth, especially as a function of hydrogen partial pressure. The mean size and density of graphene domains increased with an increase in hydrogen partial pressure during the annealing time. In addition, we found that annealing with use of only hydrogen gas resulted in snowflake-shaped carbon aggregates. Energy-dispersive X-ray spectroscopy (EDX) and high-resolution photoemission spectroscopy (HRPES) revealed that the snowflake-shaped carbon aggregates have stacked sp(2) carbon configuration. With these observations, we demonstrate the key reaction details for each growth process and a proposed growth mechanism as a function of the partial pressure of H-2 during the annealing process.