• 文献标题:   Atom-by-atom nucleation and growth of graphene nanopores
  • 文献类型:   Article
  • 作  者:   RUSSO CJ, GOLOVCHENKO JA
  • 作者关键词:   ion beam irradiation, atomic displacement, electron microscopy
  • 出版物名称:   PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA
  • ISSN:   0027-8424
  • 通讯作者地址:   Harvard Univ
  • 被引频次:   137
  • DOI:   10.1073/pnas.1119827109
  • 出版年:   2012

▎ 摘  要

Graphene is an ideal thin membrane substrate for creating molecule-scale devices. Here we demonstrate a scalable method for creating extremely small structures in graphene with atomic precision. It consists of inducing defect nucleation centers with energetic ions, followed by edge-selective electron recoil sputtering. As a first application, we create graphene nanopores with radii as small as 3 angstrom, which corresponds to 10 atoms removed. We observe carbon atom removal from the nanopore edge in situ using an aberration-corrected electron microscope, measure the cross-section for the process, and obtain a mean edge atom displacement energy of 14.1 +/- 0.1 eV. This approach does not require focused beams and allows scalable production of single nanopores and arrays of monodisperse nanopores for atomic-scale selectively permeable membranes.