• 文献标题:   Hall effect mobility of epitaxial graphene grown on silicon carbide
  • 文献类型:   Article
  • 作  者:   TEDESCO JL, VANMIL BL, MYERSWARD RL, MCCRATE JM, KITT SA, CAMPBELL PM, JERNIGAN GG, CULBERTSON JC, EDDY CR, GASKILL DK
  • 作者关键词:  
  • 出版物名称:   APPLIED PHYSICS LETTERS
  • ISSN:   0003-6951
  • 通讯作者地址:   USN
  • 被引频次:   142
  • DOI:   10.1063/1.3224887
  • 出版年:   2009

▎ 摘  要

Epitaxial graphene (EG) films were grown in vacuo by silicon sublimation from the (0001) and (000 (1) over bar) faces of 4H-SiC and 6H-SiC. Hall effect mobilities and sheet carrier densities of the films were measured at 300 and 77 K and the data depended on the growth face. About 40% of the samples exhibited holes as the dominant carrier, independent of face. Generally, mobilities increased with decreasing carrier density, independent of carrier type and substrate polytype. The contributions of scattering mechanisms to the conductivities of the films are discussed. The results suggest that for near-intrinsic carrier densities at 300 K epitaxial graphene mobilities will be similar to 150 000 cm(2) V(-1) s(-1) on the (000 (1) over bar) face and similar to 5800 cm(2) V(-1) s(-1) on the (0001) face. (C) 2009 American Institute of Physics. [doi:10.1063/1.3224887]