• 文献标题:   Electron-Beam Manipulation of Silicon Dopants in Graphene
  • 文献类型:   Article
  • 作  者:   TRIPATHI M, MITTELBERGER A, PIKE NA, MANGLER C, MEYER JC, VERSTRAETE MJ, KOTAKOSKI J, SUSI T
  • 作者关键词:   electron microscopy, 2d material, atom manipulation, nanotechnology
  • 出版物名称:   NANO LETTERS
  • ISSN:   1530-6984 EI 1530-6992
  • 通讯作者地址:   Univ Vienna
  • 被引频次:   15
  • DOI:   10.1021/acs.nanolett.8b02406
  • 出版年:   2018

▎ 摘  要

The direct manipulation of individual atoms in materials using scanning probe microscopy has been a seminal achievement of nanotechnology. Recent advances in imaging resolution and sample stability have made scanning transmission electron microscopy a promising alternative for single-atom manipulation of covalently bound materials. Pioneering experiments using an atomically focused electron beam have demonstrated the directed movement of silicon atoms over a handful of sites within the graphene lattice. Here, we achieve a much greater degree of control, allowing us to precisely move silicon impurities along an extended path, circulating a single hexagon, or back and forth between the two graphene sublattices. Even with manual operation, our manipulation rate is already comparable to the state-of-the-art in any atomically precise technique. We further explore the influence of electron energy on the manipulation rate, supported by improved theoretical modeling taking into account the vibrations of atoms near the impurities, and implement feedback to detect manipulation events in real time. In addition to atomic-level engineering of its structure and properties, graphene also provides an excellent platform for refining the accuracy of quantitative models and for the development of automated manipulation.