▎ 摘　　要

Graphene-a monolayer of graphite-has attracted vast interest recently owing to its perfect two-dimensional crystallographic nature and its potential use in a new generation of microelectronic devices. Yet, a deposition method, which results in a large coverage of monolayer thick graphite, is still lacking. By using a chemical mechanical polishing (CMP) method we were able to deposit stress-free graphene on solid and perforated substrates alike, achieving area coverage of hundreds of microns squared.