• 文献标题:   Bottom-up Growth of Epitaxial Graphene on 6H-SiC(0001)
  • 文献类型:   Article
  • 作  者:   HUANG H, CHEN W, CHEN S, WEE ATS
  • 作者关键词:   epitaxial graphene, interfacial graphene, silicon carbide, scanning tunneling microscopy, bottomup growth
  • 出版物名称:   ACS NANO
  • ISSN:   1936-0851 EI 1936-086X
  • 通讯作者地址:   Natl Univ Singapore
  • 被引频次:   191
  • DOI:   10.1021/nn800711v
  • 出版年:   2008

▎ 摘  要

We use in situ low temperature scanning tunneling microscopy (STM) to investigate the growth mechanism of epitaxial graphene (EG) thermally grown on Si-terminated 6H-SiC(0001). Our detailed study of the transition from monolayer EG to trilayer EG reveals that EG adopts a bottom-up growth mechanism. The thermal decomposition of one single SiC bilayer underneath the EG layers causes the accumulation of carbon atoms to form a new graphene buffer layer at the EG/SiC interface. Atomically resolved STM images show that the top EG layer is physically continuous across the boundaries between the monolayer and bilayer EG regions and between the bilayer and trilayer EG regions.