• 文献标题:   Synthesis of Nitrogen-Doped Graphene by Plasma-Enhanced Chemical Vapor Deposition
  • 文献类型:   Article
  • 作  者:   TERASAWA T, SAIKI K
  • 作者关键词:  
  • 出版物名称:   JAPANESE JOURNAL OF APPLIED PHYSICS
  • ISSN:   0021-4922
  • 通讯作者地址:   Univ Tokyo
  • 被引频次:   22
  • DOI:   10.1143/JJAP.51.055101
  • 出版年:   2012

▎ 摘  要

Synthesis of nitrogen-doped graphene on Cu foils by plasma-enhanced chemical vapor deposition (PE-CVD) and the growth mechanism of doped graphene were investigated. Nitrogen atoms are incorporated into the graphene lattice and most of them exist at a graphitic (quaternary) site. Plasma reaction facilitates the doping of nitrogen atoms even at a substrate temperature as high as 950 degrees C. Doped nitrogen atoms seem to distort the graphene lattice, which causes island-like growth rather than a layer-by-layer growth. (C) 2012 The Japan Society of Applied Physics